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ISSN 2664-2441 (Online)
ISSN 2073-9583 (Print)

Phase composition, structure and level of mechanical stresses in nanoscale films of Co - Sb

Metalozn. obrobka met., 2016, Tom 77, No 1, cc.39-43

Iu. N. Makogon, Doctor of Technical Science, Professor
S. I. Sidorenko, Corresponding Member of the NAS of Ukraine, Professor
R. А. Shkarban

National Technical University of Ukraine “Kyiv Polytechnic Institute”, Kyiv

UDC 539.216.2:661.685
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The regularities of formation of phase composition and structure and the level of stress in nanoscale films CoSbx(30 nm) (1,8 < x < 4,2) (65 - 81 at. % Sb), grown by molecular beam deposition on the substrate SiO2(100 nm) / Si(001) at a temperature of 200 °С and annealed under vacuum in the range (200 - 700) °С are determined. It was found that the pattern of formation of phase composition in the Co - Sb films after deposition is defined by the sequence that is similar to the diagram of phase equilibrium for a massive state of Co - Sb system. It is shown that at annealing the films at temperatures above 300 °С the excess antimony sublimation and antimony of a crystalline phase CoSb3 occurs, which leads to increased mechanical stress of ~ 5 times and is accompanied by a decrease in the size of the coherent-scattering region phase CoSb3, occurrence of cracks and subsequent degradation of the film material.


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